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Polishing apparatus

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专利名称:Polishing apparatus

发明人:Masahiko Miyamato,Nobuo Nakamura,Jyunji

Takashita,Manabu Ando,Katsuo

Kawano,Yoshiaki Nishimura,Satoshi Yuasa

申请号:US08/157440申请日:19931126公开号:US05347763A公开日:19940920

摘要:There is disclosed a polishing apparatus utilizing a gel material as the polishingtool, in which the gel material is rotated in the vicinity of a surface to be polished, or isgiven rotating and rocking motions in direct contact with the surface to be polished.

申请人:CANON KABUSHIKI KAISHA

代理机构:Fitzpatrick, Cella, Harper & Scinto

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