专利内容由知识产权出版社提供
专利名称：Slit lens arrangement for particle beams发明人：Heiko Müller申请号：US10478752申请日：20020724公开号：US06949751B2公开日：20050927
专利附图：
摘要：A slit lens arrangement for particle beams, and particularly for the projection ofa mask onto a workpiece, includes a combined lens, having a cylinder lens and a
quadrupole lens, the optical axes of which run parallel to each other, so that the opticalaxis of the quadrupole lens may be displaced in a parallel manner and which may have a
gap-like opening between the pole shoes or in the electrodes with the same spatialrelationship to each other. Both lenses are thus so arranged relative to each other, thatthe focussing of the quadrupole lens occurs in that plane in which the cylinder lens is notfocussed, and the defocusing of the quadrupole lens occurs in that plane in which thecylinder lens focuses. Two combined lenses are provided with functionally identicalelements arranged such that the optical axes of both lenses lie coaxial to each other,defining the mid-axis of the total system and in which the beam path is telescopicthroughout the entire slit lens arrangement. The optical axis of the image is given by theoptical axis of the quadrupole. Further, the diffraction plane, or aperture plane, for thetotal system lies between both combined lenses and fixes a point on the mid-axis, relativeto which the combined lenses are arranged, so that the above are anti-symmetric to eachother and simultaneously fill the condition that the separation of the first and the secondcombined lenses from the diffraction plane and the assembly and/or the fields offunctionally identical elements in the combined lenses is in a ratio which corresponds tothe image scale, preferably, reduction ratio. The shifts of the optical axes of thequadrupole lenses of both combined lenses occur in diametrically opposed directions,such that the size of the shifts are in a ratio to each other which corresponds to theimage scale, preferably, the reduction ratio.
申请人：Heiko Müller
地址：Ortenauer Str. 17 69126 Heidelberg DE
国籍：DE
代理人：Edwin D. Schindler
更多信息请下载全文后查看