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专利名称：Bimodal block copolymer, process for
manufacturing method and its usage
发明人：Jong-Geun Kim,Sam-Min Kim,Dai-Seung
Choi,Jong-Hyun Park
申请号：US10379852申请日：20030305
公开号：US20030216511A1公开日：20031120
摘要：The present invention relates to a bimodal linear block copolymer containing atapered block and its manufacturing method. The bimodal linear block copolymerincludes a hexa-block copolymer of vinyl aromatic block(PS1)-conjugated dieneblock(PB1)-tapered block(T1)-vinyl aromatic block(PS2-PS3)-conjugated diene
block(PB2)-vinyl aromatic block (PS4) as prepared by adding two charges of an initiator,and a tri-block copolymer of vinyl aromatic block(PS3)-conjugated diene block(PB2)-vinylaromatic block (PS4). The bimodal linear block copolymer is prepared by adding morethan one charge of the initiator, vinyl aromatic monomers and conjugated diene
monomers to acquire transparency, toughness, rigidity and flexibility, and thereby can beused for sheets or films, or injection or blow molding products.
申请人：KOREA KUMHO PETROCHEMICAL CO., LTD.
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