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3D NAND with oxide semiconductor channel

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专利名称:3D NAND with oxide semiconductor channel发明人:Peter Rabkin,Johann Alsmeier,Masaaki

Higashitani

申请号:US145529申请日:20141125公开号:US09634097B2公开日:20170425

专利附图:

摘要:Disclosed herein are 3D NAND memory devices having an oxide semiconductorvertical NAND channel and methods for forming the same. The oxide semiconductor mayhave a crystalline structure. The channel of the vertically-oriented NAND string may be

cylindrically shaped. The crystalline structure has an axis that may be aligned crystallinewith respect to the cylindrical shape of the vertically-oriented channel substantiallythroughout the vertically-oriented channel. The crystalline structure may have a first axisthat is aligned parallel to the vertical channel, a second axis that is aligned perpendicularto a surface of the cylindrically shaped channel, etc.

申请人:SanDisk Technologies Inc.

地址:Plano TX US

国籍:US

代理机构:Vierra Magen Marcus LLP

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