专利内容由知识产权出版社提供
专利名称：Indentification of the composition of
particles in a process chamber
发明人：Richard A. Rathbone申请号：US08/911471申请日：19970814公开号：US06015718A公开日：20000118
摘要：The invention enables the identification of particles in a chamber in which asubstrate is processed (e.g., a semiconductor process chamber). Such identification can beaccomplished by placing a test substrate [(i.e. , a substrate that is examined to detect andidentify particles present on the substrate)] in the process chamber and inspecting thetest substrate, where the composition of the test substrate is chosen so as to enableidentification of particles having a composition that includes one or more of a predefinedset of elements. For example, the composition of the test substrate can be chosen sothat each of the elements that substantially comprise the composition of the testsubstrate are different than each of the elements that substantially comprise thecomposition or compositions of a process substrate or substrates [(i.e., a substrate thathas been processed in the chamber during the normal course of operation of thechamber)], thus enabling the identification of the presence in a particle of an elementthat is part of the composition of a process substrate. The invention can be used
generally to identify the composition of particles in any type of process chamber used toprocess any type of substrate; however, the invention can be particularly advantageouslyused to identify the composition of particles present in a semiconductor process
chamber and, in particular, such chamber that is used to process substrates made ofsilicon. In such case, the test substrate can have a composition that includes substantiallyno silicon. A test substrate for use with the invention can be made of, for example,Teflon™, gallium arsenide, ruby or some combination of those materials.
申请人：CYPRESS SEMICONDUCTOR CORPORATION
代理人：David R. Graham
更多信息请下载全文后查看