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专利名称：METHOD AND APPARATUS FOR
DEPOSITING THIN LAYERS OF POLYMERICPARA-XYLYLENE OR SUBSTITUTED PARA-XYLYLENE
发明人：GERSDORFF, Markus,GOPI, Baskar,
Pagadala,MEYER, Nico
申请号：EP09757537.7申请日：20090603公开号：EP2293883B1公开日：20180321
摘要：The invention relates to an apparatus and a method for depositing one or morethin layers of polymeric para-xylylene. Said apparatus comprises a heated evaporator (1)used for evaporating a solid or liquid starting material. A supply pipe (11) for a carrier gasextends into said evaporator (1). The carrier gas conducts the evaporated startingmaterial, in particular the evaporated polymer, into a pyrolysis chamber (2) which islocated downstream of the evaporator (1) and in which the starting material is
decomposed. The apparatus further comprises a deposition chamber (8) which is locateddownstream of the decomposition chamber (2) and encompasses a gas inlet (3) throughwhich the decomposed product conducted by the carrier gas is admitted, a susceptor (4)which has a supporting surface (4′) opposite the gas inlet (3) in order to support asubstrate (7) that is to be coated with the polymerized decomposed product, and a gasoutlet (5). In order to be able to deposit a thin polymer layer that especially has ahomogeneous layer thickness and covers a large area, the gas inlet (2) forms a planar gas
distributor which has a gas discharge surface (3′) that extends parallel to the supportingsurface (4′) and is fitted with a plurality of gas discharge ports (6) distributed across theentire gas discharge surface (3′).
申请人：Aixtron SE,AIXTRON SE,AIXTRON SE
地址：DE
国籍：DE
代理机构：Grundmann, Dirk
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