Electrochemical etching cell

专利名称：Electrochemical etching cell

发明人：Hans Artmann,Wilhelm Frey,Franz Laermer申请号：US09937926申请日：20011226公开号：US06726815B1公开日：20040427

专利附图：

摘要：An electrochemical etching cell () is proposed for etching an etching body ()made at least superficially of an etching material. The etching cell () has at least onechamber filled with an electrolyte, and is provided with a first electrode (), which at leastsuperficially has a first electrode material, and with a second electrode () which at least

superficially has a second electrode material. Furthermore, the etching body () is incontact, at least region-wise, with the electrolyte. In this context, the first electrodematerial and the second electrode material are selected such that, after the etching, theetching body () is not contaminated and/or is not impaired in its properties by theelectrode materials. In particular, the electrode materials are the same materials as theetching material. Also proposed is a method for etching an etching body () using thisetching cell (), the first and/or the second electrode () being used as a sacrificial

electrode. The proposed etching cell is particularly suitable for etching silicon wafers in aCMOS-compatible production line.

申请人：ROBERT BOSCH GMBH

代理机构：Kenyon & Kenyon

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