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专利名称：PRE-COLORED METHODOLOGY OF
MULTIPLE PATTERNING
发明人：Yen-Huei Chen,Wei Min Chan,Hung-Jen
Liao,Jonathan Tsung-Yung Chang
申请号：US13586177申请日：20120815
公开号：US20130263065A1公开日：20131003
专利附图：
摘要：Some embodiments relate to a method for pre-coloring data within an
integrated chip layout to avoid overlay errors that result from mask misalignment during
multiple patterning lithography. The method may be performed by generating agraphical IC layout file containing an integrated chip layout having a plurality of ICshapes. The IC shapes within the graphical IC layout file are assigned a color duringdecomposition. The IC shapes are further pre-colored in a manner that deliberatelyassigns the pre-colored data to a same mask. During mask building data associated withIC shapes that have been pre-colored is automatically sent to a same mask, regardless ofthe colors that are assigned to the shapes. Therefore, the pre-colored shapes are notassigned to a masked based upon a decomposition, but rather based upon the pre-coloring. By assigning IC shapes to a same mask through pre-coloring, overlay errors canbe reduced.
申请人：Yen-Huei Chen,Wei Min Chan,Hung-Jen Liao,Jonathan Tsung-Yung Chang
地址：Jhudong Township TW,Sindian City TW,Hsinchu City TW,Hsinchu City TW
国籍：TW,TW,TW,TW
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